CYKY diamond Single Side Lapping/Polishing machines SSP-50DPAW feature rotary models with sophisticated control systems. This model is capable of executing complex lapping and polishing routines process while producing precise and repeatable results with a special auto-facing unit to control plate performance
CYKY diamond Single Side Lapping/Polishing machines SSP-50DPAW feature rotary models with sophisticated control systems. This model is capable of executing complex lapping and polishing routines process while producing precise and repeatable results with a special auto-facing unit to control plate performance.
• Sapphire Substrate / Wafer
• Semiconductor Wafer
• Tungsten Carbide Parts
• Ceramic Parts
• Valves
• Crystal Glass
• Oscillator Parts
Items | SSP-36DPAW | SSP-50DPAW | |||
Polishing plate | Plate material | Oxygen free Cu , Resin-Cu | Oxygen free Cu | ||
Or Tin plate (*option) | or Tin plate(*option) | ||||
Plate size | Φ910mm | Φ1240mm | |||
Revolution control | By inverter. | Home position. | |||
Plate cooling | Cooling water jacket | Cooling water jacket | |||
Pressure plate | P. Plate | 4 axles. | 4 axles. | ||
Block size | 360mmΦ | 485mmΦ | |||
Applied pressure | By cylinder | By cylinder | |||
Work block | - | Auto Centering | |||
Facing unit | Mounting type. | Square type. | |||
Capacity / batch | 4 inch wafer x 24 Pcs | 4 inch wafer x 40 Pcs | |||
6 inch wafer x 12 Pcs | 6 inch wafer x 24 Pcs | ||||
Utility | Electricity | AC220V, 3Phase, 60Hz | AC220V, 3Phase, 60Hz | ||
Pneumatic | 0.5~0.8 Mpa | 0.5~0.8 Mpa | |||
Etc | Machine Size | 1350 *2250 *1920 mm | 1640 *3029 *2575 mm | ||
Machine Weight | 3,500Kg. | 5,500Kg. | |||
Controller | Touch Screen (Proface) | Touch Screen (Proface) | |||
Signal lamp with alarm |
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